4 types of chemical purification of gases explained
The need for cleaner gases is increasing. Not only in the semiconductor industry, but also in pharmaceuticals, hydrogen economy and research. Clean gases are essential for maximum process reliability. Gases such as CDA (Clean Dry Air), CO2 and hydrogen are often purified to a significantly higher downstream quality. The gas contains very little impurities < 0.1 ppb (parts per billion) and has a purity of 99.9999999% (9N). Filters and purifiers are used in the production of clean gas. The 4 most used technologies are explained here.
In this article, we try to help engineers make design choices by explaining the 4 different purifier methods. These are:
Purifiers of the getter type use zirconium alloys to purify gases. Zirconium alloys are highly reactive with a wide range of gases that are often contaminants, such as:
The reactions that take place in the purifier are irreversible and form oxides, nitrides and carbides.
Illustration: The getter purifier principle works better at high temperature because diffusion of impurities into the granules is promoted.
In getter purifiers the vessel is filled with grains, pellets or granules of the zirconium alloy. The flowing gas hits the pellets on the outside and that is where the reactions will take place. The gases which form a pollutant can diffuse into the pellets but will do much better under a heated atmosphere. Getter purifiers can therefore work well under room temperature but in many cases the efficiency becomes acceptable only when the pellet is heated so that diffusion is improved. In that case we call the getter purifier a heated getter purifier. Two terms often used interchangeably.
Hydrogen is an exception. It reacts inversely with temperature: the lower the temperature, the higher the purification capacity for hydrogen, and at higher temperatures its reactivity decreases.
The gases that form a contaminant react with transition metals. Examples are nickel and copper.
The aim is to maximise the surface area between the process gas and the metal. To this end, the metal is deposited on inert substrates that are finely structured. For example, aluminium oxide, silica or diatomaceous earth (photo).
The metals used are highly reactive with a variety of gases often classified as contaminants, such as:
Photo: An example of a granulate from a purifier, consisting of 4 different components.
The major advantage of this technology is that the reactions that take place are so-called chemisorption reactions and are therefore reversible. A few examples:
The performance of this type of purifier is strongly influenced by the shape of the surface on which the deposition of the nickel or copper has taken place.
The reactive catalyst purifier type is probably the most widely used purifier type, due to its versatility and reusability. The multitude of applications falls into three main groups:
The catalytic purifier is made of palladium or platinum. It initiates chemical reactions but does not participate in them. A low percentage of metal is deposited on an inert substrate with a large surface area. They are used to reduce THC, CO, H2 from high PPM levels to low PPT levels.
This type of purifier is a real catalyst and the medium is not consumed.
The catalytic purifier is probably the least frequently used purifier type. Especially in UHP applications of oxygen this type is used. Especially for the removal of hydrocarbons from O2.
Photo: Four different types of granules for purifiers. The shape differs to control absorbency.
The adsorber purifiers are actually molecular sieves. Often constructed from silica gel or carbon. This principle is also applied on the consumer market. The adsorbers are very efficient for certain impurities. Carbon dioxide CO2, water H2O, acids, bases and heavy hydrocarbons are particularly well removed.
The adsorber removes impurities by physical adsorption which makes the efficiency dependent on the pore size. The reactions take place on the surface without diffusion in the bulk. The adsorber granulate is very porous to increase the surface area.
Photo: Purifiers are always provided with filters on the inlet and possibly also the outlet. The particle size varies from 1μm to 1.5 nm.
Are installed directly at the place of the consumer. Usually with a flow rate of 0.1-100 slpm.
More informationAlso called Area purifiers. Are often used to feed a number of machines with ultra pure process gas. Nominal flows 100-1200 slpm.
More informationGas supply in semicon fabs, or at industrial gas suppliers. Flows of 60-20.000 nm3/h.
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